This workshop was sponsored by Elionix. 

It will cover:

• Pattern design and data preparation using BEAMER
• High-resolution writing on the Elionix ELS-G100 EBL system
• Pattern transfer using etching techniques
• Metal lift-off processing

Participants gain practical cleanroom experience in high-resolution lithography and processing, applicable to microelectronics, photonics, and quantum device fabrication.

Who should attend: Researchers, students, and industry professionals interested in nanoscale fabrication.

Location: Marcus Nanotechnology building, Georgia Tech

Rates: *Rates include lunches on both days*

• Georgia Tech Rate: $200
• Academic and Government Rate: $400
• Industry Rate: $1000

Our next EBL workshop will take place June 29-30, 2026.

Registration closes June 10, 2026.