The Meeting for Advanced Electron Beam Lithography (MAEBL) enters its eighth consecutive year, with our friends at the Georgia Institute of Technology (Georgia Tech) hosting the hybrid meeting on September 24–26, 2024. This year’s 2.5-day main program will foster engagement and knowledge exchange within the electron beam lithography (EBL) scientific community. For those arriving early and attending in person, attendees are invited to participate in a tour of Georgia Tech’s nanofabrication facilities and a discussion on lab operations on Day 0. Our Foundations Workshop on Day 1 for beginner and experienced users kick off our scheduled talks. The final component of the event is the MAEBL Core Meeting to discuss advanced state-of-the art techniques. The registration cost is the same for in-person and online attendees. Included again in this year’s registration is access to our bonus MAEBLx meetings. Students continue to receive a reduced registration rate to encourage their participation.