SENIC Technical Webinar: Fundamentals of Photomask Design

Event Details
Contact

paul.joseph@ien.gatech.edu

Summaries

Summary Sentence: A brief overview of the terminology, technology, techniques around photomask design & creation, and the tools needed to evaluate and fabricate a successful photomask set will be presented.

Full Summary: No summary paragraph submitted.

SENIC Technical Webinar: Fundamentals of Photomask Design

Ben Hollerbach: Process-Equipment Engineer II; Institute for Electronics and Nanotechnology, Georgia Institute of Technology

Abstract: The creation of a photomask set is the first step to producing any variety of semiconductor devices. Thinking through how each mask will be used and the processing steps around them will ensure a smoother process flow and greater device yield. A brief overview of the terminology, technology, techniques around photomask design & creation, and the tools needed to evaluate and fabricate a successful photomask set will be presented.


Bio: Mr. Ben Hollerbach is a Process-Equipment Engineer at Georgia Tech’s Institute for Electronics and Nanotechnology. He started working for the IEN in 2005 while a student at Georgia Tech. After received his bachelor’s degree in industrial design he began working full time for the IEN and in 2009 took over the management of the IEN’s Mask Shop. Over the past 11 years Ben has managed the evolution of photomask production from the use of a 1970’s era GCA Mann Pattern Generator & Stepper through first generation Laser Writers to today’s modern Heidelberg MLA150 Maskless Aligners.


Who should attend: Faculty, scientists, engineers, researchers, and technical staff from university, company, or government labs who are interested in learning about, micro-fabrication, in particular, photomask design, as part of their research efforts.

Participants are requested to register in advance so that we will be able to understand the technological background and needs of the audience, as well as to send timely webinar reminders.

Click Here to Access the Registration Link:
 https://tinyurl.com/IENexperts3

Additional Information

In Campus Calendar
Yes
Groups

3D Systems Packaging Research Center, Georgia Electronic Design Center (GEDC), Institute for Electronics and Nanotechnology, NanoTECH, The Center for MEMS and Microsystems Technologies

Invited Audience
Faculty/Staff, Postdoc, Public, Graduate students, Undergraduate students
Categories
Career/Professional development, Seminar/Lecture/Colloquium, Training/Workshop
Keywords
Institute for Electronics and Nanotechnology, Electrical and Computer Engineering, Semiconductor Devices, photomask fabrication, device yield, Heidelberg MLA150, Maskless Aligner, cleanroom techniques
Status
  • Created By: Christa Ernst
  • Workflow Status: Published
  • Created On: May 29, 2020 - 1:16pm
  • Last Updated: May 29, 2020 - 1:16pm