The Institute for Electronics and Nanotechnology (IEN) of at  Georgia Tech, a preeminent academic center for nanoscience and engineering research in the U.S., has entered into a collaboration with Optec Laser Systems for the advancement of laser-based material processing methods and applications at their Atlanta campus. Optec, a Belgium company with more than 25 years of experience in laser R&D, and facilities in San Diego, California, is a leading manufacturer of high precision laser micro-machining systems for high volume production and athermal processing. Optec engineers are experts specializing in deep UV and ultra-short (USP) laser modalities.

In November of 2018, IEN’s Laser Micro Machining Center (LMMC) took delivery of Optec’s WS-FLEX-USP femtosecond, direct-write laser system configured to support the Institute’s diverse research interests as applied to texturing and surface modification of metals, ceramics, composites, polymers and glasses in the fields of biocompatible materials, microfluidics, flexible electronics, MEMS/NEMS microsystems, photovoltaics and energy storage. The Optec system resides in one of the Pettit shared laboratories open to Georgia Tech academic users, small and large companies, and external academic and government research institutions. IEN’s shared laboratories are part of the NSF-funded National Nanotechnology Coordinated Infrastructure (NNCI), a network of 16 academic nanofabrication and -characterization sites and their partners in the U.S., formed to advance research in nanoscale science, engineering and technology.

IEN is the coordinating body for NSF’s National Nanotechnology Coordinated Infrastructure (NNCI), a consortium of 16 sites in 15 states involving 27 universities who’s 5-year mission is to advance research in nanoscale science, engineering and technology.  The Optec system will reside in one of the shared laboratories open to Georgia Tech academic users, small and large companies, and external academic and government research institutions.

The WS-FLEX IR  femtosecond laser with sub-500 fs pulse length IR femtosecond laser will be equipped with 300 x 300 mm XY stages, a 2-D scan head, including synchronized infinite-field-of-view motion control, plus a fixed-beam cutting head with coaxial gas shielding for maximum versatility and a high definition, zoom inspection microscope under the control of the onboard ProcessPower and OptecCAD laser micro-machining software. 

The addition of femtosecond capability compliments IEN’s selection of laser processing equipment , covering deep UV through far IR wavelengths, including an Optec excimer-based MicroMaster mask-projection system, and now ultrashort pulse output through continuous wave (CW) output.