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  <title><![CDATA[PhD Defense by Xiaoyue Xin]]></title>
  <body><![CDATA[<p><em>Defense announced 11 days in advance due to Georgia Tech holiday office closure.&nbsp;</em></p><p>School of Civil and Environmental Engineering</p><p>Ph.D. Thesis Defense Announcement</p><p><strong>Advanced Treatment Processes for Destruction of Per- and Polyfluoroalkyl Substances (PFAS) in Water Treatment</strong></p><p>By<strong>&nbsp;Xiaoyue Xin</strong></p><p>Advisor:</p><p><strong>Dr. Ching-Hua Huang</strong></p><p>Committee Members:<strong>&nbsp; Dr. Yongsheng Chen (CEE)</strong>,<strong>&nbsp;Dr. Sotira Yiacoumi (CEE)</strong>,<strong>&nbsp;&nbsp;&nbsp;&nbsp;&nbsp; Dr. Shane Snyder (CEE)</strong>,<strong>&nbsp;Dr. Daniel Ashley (Spelman College)</strong></p><p>Date and Time:<strong>&nbsp; July, 18, 2025.&nbsp; 9:00 – 11:00 AM EST</strong></p><p>Location:&nbsp;Ford ES&amp;T 3229</p><p>Teams Meeting ID: 220 473 631 260 7; Passcode: QQ3DW6wK</p><p>Per- and polyfluoroalkyl substances (PFAS) are a class of persistent anthropogenic<br>contaminants recognized for their widespread environmental occurrence,<br>bioaccumulation, and significant health implications. Their exceptional resistance<br>to conventional water treatment methods underscores the critical need for<br>innovative remediation technologies. Conventional UV lamps, emitting primarily at<br>254 nm or higher wavelengths, are useful in advanced water treatment processes;<br>however, these lamps present some limitations, including mercury use, limited<br>photon energy, and low efficiency in generating reactive species for contaminant<br>degradation. This study investigates novel far-UVC irradiation at 222 nm, a mercuryfree,<br>higher photon energy UV technology with the potential of enhancing reactive<br>species generation and improving contaminant degradation efficiency. This<br><br>research comprehensively evaluates the effectiveness of far-UVC 222 nm as an<br>advanced treatment strategy for PFAS-contaminated waters through direct<br>photolysis, advanced reduction processes (ARPs), and advanced oxidation<br>processes (AOPs).<br>First, this study investigated the susceptibility of 19 representative PFAS to direct<br>photolysis and defluorination under far-UVC 222-nm irradiation. Enhanced<br>photolysis occurred for perfluorocarboxylic acids (PFCAs), fluorotelomer<br>unsaturated carboxylic acids (FTUCAs) and GenX, compared to that at conventional<br>254-nm irradiation on a similar fluence basis. In contrast, other PFAS, including<br>PFSAs, 6:2 diPAP, 5:3 FTCA, 6:2 FTS, FOSA and FHxSA, showed minimal decay by<br>photolysis under UV 222 nm irradiation. For degradable PFAS, up to 81% of parent<br>compound decay (photolysis rate constant (k222-nm) = 8.19-34.76 L·Einstein-1;<br>quantum yield (222-nm) = 0.031-0.158) and up to 31% of defluorination were<br>achieved within four hours, and the major transformation products were shorterchain<br>PFCAs. Solution pH, dissolved oxygen, carbonate, phosphate, chloride and<br>humic acids had mild impacts, while nitrate significantly affected PFAS<br>photolysis/defluorination at 222 nm. Decarboxylation is a crucial step of photolytic<br>decay. The slower degradation of short-chain PFCAs than long-chain ones are<br>related to molar absorptivity and may also be influenced by chain-length dependent<br>structural factors, such as differences in pKa, conformation, and perfluoroalkyl<br>radical stability. Meanwhile, the possible transformation pathway of PFCAs was<br>explored using density functional theory (DFT)-based theoretical calculations.<br>These new findings are among the first to demonstrate the capability of 222-nm<br>light to degrade PFAS and provide the basis for further development of far-UVC<br>technology for PFAS in water treatment.<br>Second, PFAS degradation by integrating far-UVC irradiation at 222 nm with sulfitebased<br>advanced reduction processes (ARPs) was investigated. The UV-based ARPs<br>have emerged as an effective strategy to degrade and defluorinate PFAS<br>contaminants in water. However, current studies have mainly focused on UV 254<br>nm irradiation, and the feasibility of treating PFAS with UV222/ARP remains<br>unknown. Comparative analysis on the fundamental photochemical properties of<br>UV222/sulfite systems and conventional UV254/sulfite systems revealed that 222-<br><br>nm irradiation significantly improves the performance by generation of more<br>hydrated electrons (eaq<br>-), the primary reactive species driving PFAS degradation, and<br>exhibits superior energy efficiency, characterized by lower electrical energy per<br>order (EEO). The higher efficiency of UV222/sulfite can be attributed to stronger light<br>absorption of sulfite and higher photon energy at 222 nm. Under optimized stepwise<br>sulfite dosing conditions, the UV222/sulfite ARP achieved high perfluorooctyl<br>sulfonic acid (PFOS) removal efficiency, nearly 85% reduction in parent compound<br>and 66% defluorination within a six-hour period, while the degradation of shorterchain<br>PFHxS and PFBS was slower. Real water matrix components can influence<br>treatment efficiency. The impacts of nitrate/nitrite were transient that diminished<br>after rapid photolysis at 222 nm, while dissolved organic matter (DOM) and<br>carbonates exerted strong reactive species scavenging effects. These findings<br>establish UV222/sulfite ARP as a promising strategy to enhance PFAS degradation.<br>Careful optimization of system parameters and water matrices will increase the<br>adaptability for PFAS environmental remediation.<br>Third, a pilot-scale investigation was conducted to assess the influence of ozonation<br>(O3) and ozone/hydrogen peroxide (O3/H2O2) advanced oxidation process (AOP),<br>respectively, on the fate of PFAS in a wastewater effluent subjected to reuse. The<br>objective was to assess the potential of PFAS transformation by AOP under real<br>water treatment conditions. The study evaluated 40 target PFAS and associated<br>precursors (based on the total oxidizable precursor (TOP) assay) under various<br>treatment conditions, including different ozone doses (1.0-4.0 mg·L-1), H2O2 doses<br>(0-0.20 mg·L-1), and contact time (0–20 min). Results indicated that short-chain (C3-<br>C7) PFAAs dominated in concentrations, while overall PFAA concentrations were<br>elevated by both oxidative treatment processes, particularly after high-dose<br>ozonation treatment. TOP assays revealed that there were considerable amounts of<br>PFAA precursors in the reuse wastewater and their concentrations were decreased<br>after the oxidative treatment with increase of some of the PFAAs. This pilot study<br>demonstrated that ozone and ozone-based AOP treatments can have a moderate<br>influence on the transformation of PFAS and increase of PFAA levels under practical<br>conditions.<br>Last, based on previous study suggesting the potential of ozone and AOP in the<br>transformation of PFAS precursors into terminal PFAAs, and growing research<br><br>A Unit of the University System of Georgia • An Equal Education and Employment Opportunity Institution<br>evidence supporting the potential of oxidizing PFAA precursors into terminal PFAAs<br>through UV/AOPs, mainly through the facilitation of generation of reactive radical<br>species, PFAS degradation by integrating far-UVC irradiation at 222 nm with<br>peroxydisulfate (PDS)-based AOPs was thus explored. Comparative analysis of<br>UV222/PDS and conventional UV254/PDS systems revealed that 222-nm irradiation<br>significantly enhanced the generation of reactive radical species, including hydroxyl<br>and sulfate radicals, thereby accelerating degradation kinetics of PFAS precursors.<br>Radical generation was highly influenced by reaction conditions, such as solution<br>pH, initial PDS dose, and UV fluence. PFAS precursors including 6:2 FTSA, 6:2 FTCA,<br>and FHxSA showed rapid and complete decay within a short irradiation time. A<br>unique advantage of UV222/PDS treatment was the capacity for continuous<br>degradation, as PFAS precursors transformed into terminal PFCAs, subsequently<br>undergoing direct photolysis, resulting in chain-shortening and moderate overall<br>defluorination. However, terminal PFAS such as PFOA demonstrated limited<br>enhancement under UV222/PDS conditions. GenX exhibited moderate<br>improvement, whereas Perfluoro(2-ethoxyethane)sulfonic acid (PFEESA) remained<br>resistant to degradation by UV222/PDS. Real water matrices notably reduced<br>UV222/PDS efficiency, slowing PFAS precursor degradation and increasing<br>intermediate byproduct formation. UV222/PDS systems present significant<br>promises for enhancing remediation of PFAS precursors, although addressing<br>limitations associated with terminal PFAS and complex water matrices remains<br>essential for broad environmental applicability.<br>Overall, this study demonstrates the exceptional potential and significant<br>advantages of far-UVC irradiation at 222 nm for PFAS remediation, presenting<br>detailed mechanistic insights and identifying both strengths and ongoing<br>challenges. The thorough exploration of water matrix effects enhances the practical<br>relevance of these findings, offering valuable guidance for optimizing treatment<br>strategies in real-world applications. This research substantially advances scientific<br>understanding and informs the future development of innovative, scalable, and<br>sustainable solutions to address global PFAS contamination challenges.</p>]]></body>
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