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  <title><![CDATA[Ph.D. Dissertation Defense - Zhiyu Xu]]></title>
  <body><![CDATA[<p><strong>Title</strong><em>:&nbsp; Development, Fabrication and Characterization of III-Nitride Bipolar Devices: Rectifiers, Avalanche Photodiodes, and Laser Diodes</em></p><p><strong>Committee:</strong></p><p>Dr. Russell Dupuis, ECE, Chair, Advisor</p><p>Dr. Shyh-Chiang Shen, ECE, Co-Advisor</p><p>Dr. Wenshan Cai, ECE</p><p>Dr. Ali Adibi, ECE</p><p>Dr. Doug Yoder, ECE</p><p>Dr. Nepomuk Otte, Physics</p>]]></body>
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      <value><![CDATA[Development, Fabrication and Characterization of III-Nitride Bipolar Devices: Rectifiers, Avalanche Photodiodes, and Laser Diodes ]]></value>
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      <value><![CDATA[<p>GaN as a wide-bandgap semiconductor material (~3.4eV) with high critical electrical field (~3MV/cm) and direct bandgap, is a promising candidate for next-generation power devices and optoelectronics. In this thesis, the development of III-nitride bipolar devices is discussed. The studies and research mainly involve the design, fabrication process and characterization of vertical GaN p-i-n (PIN) rectifiers, GaN-based UV avalanche photodiodes (APDs) and UV laser diodes (LDs) based on the AlGaN/GaN non-planar growth (NPG) method. Vertical GaN PIN rectifiers with nitrogen-implanted floating guard rings (FGRs) are designed and fabricated. A minimum low specific-on resistance (RONA) of 0.23 mΩ-cm2 was achieved with high reverse-bias breakdown voltage up to -1360V on the fabricated PIN rectifiers. High ION/IOFF ratio was obtained &gt;1012 at ±4 V, owning to the low reverse leakage and high forward-biased injection current. High optical avalanche gain and low reverse-bias leakage GaN APDs were developed by implementation of a ~1.8° shallow bevel mesa, achieving an ultra-low leakage current density less than 10-9 A/cm2 up to a reverse bias voltage of -70V and high avalanche multiplication gains &gt; 107 under DUV illumination. The NPG on patterned (0001) GaN substrates was developed for growth of crack-free thick relatively high Al alloy composition AlGaN layers by suppression of tensile strain from AlGaN layer on GaN. The first UV pulsed-mode diode laser at ~370 nm based on AlGaN/GaN NPG on GaN substrates was demonstrated with a 300 K lasing wavelength of 370 nm and the minimal threshold current density achieved of 8.8 kA/cm2.</p>]]></value>
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      <value><![CDATA[2024-07-25T10:00:00-04:00]]></value>
      <value2><![CDATA[2024-07-25T12:00:00-04:00]]></value2>
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      <timezone><![CDATA[America/New_York]]></timezone>
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      <value><![CDATA[Room W218, Van Leer]]></value>
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          <item><![CDATA[ECE Ph.D. Dissertation Defenses]]></item>
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        <value><![CDATA[Other/Miscellaneous]]></value>
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        <value><![CDATA[Phd Defense]]></value>
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