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  <title><![CDATA[Enabling Miniaturization]]></title>
  <body><![CDATA[<p>Speaker: Phil Mooney</p>

<p>This will be an overview of the technology behind the microArch system, compatible materials, post processing techniques for the S140 Boston Micro Fab printer.</p>

<p><strong>Speaker Bio</strong><br />
Phil Mooney is an applications engineer at Boston Microfabrication who has been in the additive manufacturing industry for almost six years. He has previously worked as an applications engineer at Staratasys and a 3D Systems partner, giving him a solid foundation of using a variety of 3D printing processes. His educational background comes from the plastics engineering program at the University of Massachusetts Lowell, where he received both his bachelors and masters degrees. While at UMass Lowell, his graduate research focused on super omniphobic textile fabrication at the Center for High-rate Nanomanufacturing for the U.S. Army.</p>
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      <value><![CDATA[An overview of the technology behind the microArch system, compatible materials, post processing techniques for the S140 Boston Micro Fab printer.  ]]></value>
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      <value><![CDATA[<p>An overview of the technology behind the microArch system, compatible materials, post processing techniques for the S140 Boston Micro Fab printer.&nbsp;</p>

<p>&nbsp;</p>
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      <value><![CDATA[2022-04-01T10:00:00-04:00]]></value>
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      <value><![CDATA[<p><a href="mailto:nroeske3@gatech.edu">Nikolas Roeske</a> - 404.273.8674<br />
<a href="mailto:mthomas81@gatech.edu">Thomas Matthew</a> - 706.244.5626</p>
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      <url><![CDATA[https://bme.gatech.edu/bme/marcus-nanotechnology-building]]></url>
      <title><![CDATA[Marcus Nanotechnology Building]]></title>
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          <item><![CDATA[Institute for Electronics and Nanotechnology]]></item>
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