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  <title><![CDATA[Ph.D. Dissertation Defense - Ying-Yuan Huang]]></title>
  <body><![CDATA[<p><strong>Title</strong><em>:&nbsp; </em><em>Development of Low-Cost High-Efficiency Tunnel Oxide Passivated Contact Silicon Solar Cells</em></p>

<p><strong>Committee:</strong></p>

<p>Dr. Ajeet Rohatgi, ECE, Chair, Advisor</p>

<p>Dr. , Co-Advisor</p>

<p>Dr. Bernard Kippelen, ECE</p>

<p>Dr. Benjamin Klein, ECE</p>

<p>Dr. Thomas Gaylord, ECE</p>

<p>Dr. Juan-Pablo Correa-Baena, MSE</p>

<p><strong>Abstract: </strong>The objective of this research is to achieve low-cost high-efficiency (&gt;23%) commercial ready bifacial screen-printed n-type Si solar cells through a combination of fundamental understanding, modeling and design, technology innovations, and complete cell fabrication. This research involves developing a technology roadmap by device modeling and simulations to achieve &gt; 23% efficiency target followed by development and implementation of required design features such as optimized boron emitter on front and tunnel oxide passivated contact (TOPCon) on the rear side of an n-type silicon wafer, in combination with advanced fine-line screen-printing metallization with floating busbars to attain the efficiency target. Carrier-selective passivating contacts consist of material structures in-between of c-Si and metal electrode, which effectively reduce electron-hole recombination through defect states at the c-Si surface while working as contacts to extract either electrons or holes from the c-Si absorber. A next-generation industry-compatible double-side passivated contacts solar cell structure is also proposed. This cell structure is composed of full area p-TOPCon on the rear and selective area n-TOPCon on the front side of an n-type Si wafer. Detailed modeling using practically achievable material and device parameters shows that ~25.4% efficiency is achievable with this design using traditional screen-printing.</p>
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